@misc{scil_nano,
      howpublished    = "\url{https://www.scil-nano.com}"
    }

@misc{als632,
      howpublished    = "\url{http://cxro.lbl.gov/als632/}"
    }

@misc{cxro_data,
      howpublished    = "\url{http://henke.lbl.gov/optical_constants/}"
    }

@misc{psu_mri,
      howpublished    = "\url{https://www.mri.psu.edu/}"
    }

@misc{pcgrate,
      howpublished    = "\url{https://www.pcgrate.com/loadpurc/download}"
    }

@book{Attwood17, place={Cambridge}, edition={2}, title={X-Rays and Extreme Ultraviolet Radiation: Principles and Applications}, DOI={10.1017/CBO9781107477629}, publisher={Cambridge University Press}, author={Attwood, David and Sakdinawat, Anne}, year={2017}}

@book{Brinker90,
  title={Sol-Gel Science: The Physics and Chemistry of Sol-Gel Processing},
  author={Brinker, C.J. and Brinker, C.J. and Scherer, G.W.},
  isbn={9780121349707},
  lccn={89015631},
  url={https://books.google.com/books?id=ewJUAAAAMAAJ},
  year={1990},
  publisher={Elsevier Science}
}

@ARTICLE{Cash83,
   author = {{Cash}, Jr., W.~C.},
    title = "{X-ray spectrographs using radial groove gratings}",
  journal = {Applied Optics},
 keywords = {X RAYS, GRATINGS, ULTRAVIOLET: EXTREME, SPECTROGRAPHS},
     year = 1983,
   volume = 22,
    pages = {3971-3976},
      doi = {10.1364/AO.22.003971},
   adsurl = {http://adsabs.harvard.edu/abs/1983ApOpt..22.3971C},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = dec,

@ARTICLE{Cash91,
   author = {{Cash}, Jr., W.~C.},
    title = "{X-ray optics. II - A technique for high resolution spectroscopy}",
  journal = {Applied Optics},
 keywords = {Echelette Gratings, Grazing Incidence, Ray Tracing, Spectral Resolution, X Ray Spectroscopy, Charge Coupled Devices, X Ray Telescopes},
     year = 1991,
   volume = 30,
    pages = {1749-1759},
      doi = {10.1364/AO.30.001749},
   adsurl = {http://adsabs.harvard.edu/abs/1991ApOpt..30.1749C},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = may,

@ARTICLE{Chang03,
   author = {{Chang}, C.-H.},
    title = "{Fabrication of sawtooth diffraction gratings using nanoimprint lithography}",
  journal = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
     year = 2003,
   volume = 21,
    pages = {2755},
      doi = {10.1116/1.1627814},
   adsurl = {http://adsabs.harvard.edu/abs/2003JVSTB..21.2755C},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@ARTICLE{Chang04,
   author = {{Chang}, C.-H.},
    title = "{High fidelity blazed grating replication using nanoimprint lithography}",
  journal = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
     year = 2004,
   volume = 22,
    pages = {3260},
      doi = {10.1116/1.1809614},
   adsurl = {http://adsabs.harvard.edu/abs/2004JVSTB..22.3260C},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@ARTICLE{Chou96,
   author = {{Chou}, S.~Y. and {Krauss}, P.~R. and {Renstrom}, P.~J.},
    title = "{Nanoimprint lithography}",
  journal = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
     year = 1996,
   volume = 14,
    pages = {4129-4133},
      doi = {10.1116/1.588605},
   adsurl = {http://adsabs.harvard.edu/abs/1996JVSTB..14.4129C},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = nov,

@article{deBoer95,
  title = {X-ray reflection and transmission by rough surfaces},
  author = {de Boer, D. K. G.},
  journal = {Phys. Rev. B},
  volume = {51},
  issue = {8},
  pages = {5297--5305},
  numpages = {0},
  year = {1995},
  month = {Feb},
  publisher = {American Physical Society},
  doi = {10.1103/PhysRevB.51.5297},
  url = {https://link.aps.org/doi/10.1103/PhysRevB.51.5297}
}

@ARTICLE{DeRoo16,
       author = {{DeRoo}, Casey T. and {McEntaffer}, Randall L. and {Miles}, Drew M. and
         {Peterson}, Thomas J. and {Marlowe}, Hannah and {Tutt}, James H. and
         {Donovan}, Benjamin D. and {Menz}, Benedikt and {Burwitz}, Vadim and
         {Hartner}, Gisela and {Allured}, Ryan and {Smith}, Randall K. and
         {G{\"u}nther}, Ramses and {Yanson}, Alex and {Vacanti}, Giuseppe and
         {Ackermann}, Marcelo},
        title = "{Line spread functions of blazed off-plane gratings operated in the Littrow mounting}",
      journal = {Journal of Astronomical Telescopes, Instruments, and Systems},
     keywords = {Astrophysics - Instrumentation and Methods for Astrophysics},
         year = 2016,
        month = apr,
       volume = {2},
          eid = {025001},
        pages = {025001},
          doi = {10.1117/1.JATIS.2.2.025001},
archivePrefix = {arXiv},
       eprint = {1603.04839},
 primaryClass = {astro-ph.IM},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2016JATIS...2b5001D},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}


@INPROCEEDINGS{Donovan18,
       author = {{Donovan}, Benjamin D. and {McEntaffer}, Randall L. and
         {Tutt}, James H. and {Schultz}, Ted B. and {Biskach}, Michael P. and
         {Chan}, Kai-Wing and {Hlinka}, Michal and {Kearney}, John D. and
         {Mazzarella}, James R. and {McClelland}, Ryan S. and
         {Riveros}, Raul E. and {Saha}, Timo T. and {Zhang}, William W. and
         {Holland}, Andrew D. and {Lewis}, Matthew R. and {Soman}, Matthew R. and
         {Holland}, Karen and {Murray}, Neil J.},
        title = "{Optical design of the Off-plane Grating Rocket Experiment}",
    journal = {Proc. SPIE},
         year = 2018,
       series = {Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series},
       volume = {10699},
        month = jul,
          eid = {106993U},
        pages = {106993U},
          doi = {10.1117/12.2312219},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2018SPIE10699E..3UD},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}


@ARTICLE{Franke97,
   author = {{Franke}, A.~E. and {Schattenburg}, M.~L. and {Gullikson}, E.~M. and 
  {Cottam}, J. and {Kahn}, S.~M. and {Rasmussen}, A.},
    title = "{Super-smooth x-ray reflection grating fabrication}",
  journal = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
     year = 1997,
   volume = 15,
    pages = {2940-2945},
      doi = {10.1116/1.589759},
   adsurl = {http://adsabs.harvard.edu/abs/1997JVSTB..15.2940F},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = nov,

@ARTICLE{Gaskin19,
       author = {{Gaskin}, Jessica A. and {Swartz}, Douglas A. and {Vikhlinin}, Alexey and
         {{\"O}zel}, Feryal and {Gelmis}, Karen E. and {Arenberg}, Jonathan W. and
         {Bandler}, Simon R. and {Bautz}, Mark W. and {Civitani}, Marta M. and
         {Dominguez}, Alexandra and {Eckart}, Megan E. and
         {Falcone}, Abraham D. and {Figueroa-Feliciano}, Enectali and
         {Freeman}, Mark D. and {G{\"u}nther}, Hans M. and {Havey}, Keith A. and
         {Heilmann}, Ralf K. and {Kilaru}, Kiranmayee and {Kraft}, Ralph P. and
         {McCarley}, Kevin S. and {McEntaffer}, Randall L. and
         {Pareschi}, Giovanni and {Purcell}, William and {Reid}, Paul B. and
         {Schattenburg}, Mark L. and {Schwartz}, Daniel A. and
         {Schwartz}, Eric D. and {Tananbaum}, Harvey D. and
         {Tremblay}, Grant R. and {Zhang}, William W. and {Zuhone}, John A.},
        title = "{Lynx X-Ray Observatory: an overview}",
      journal = {Journal of Astronomical Telescopes, Instruments, and Systems},
         year = "2019",
        month = "Apr",
       volume = {5},
          eid = {021001},
        pages = {021001},
          doi = {10.1117/1.JATIS.5.2.021001},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2019JATIS...5b1001G},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@Inbook{Gibaud2009,
author="Gibaud, A.
and Vignaud, G.",
title="Specular Reflectivity from Smooth and Rough Surfaces",
bookTitle="X-ray and Neutron Reflectivity: Principles and Applications",
year="2009",
publisher="Springer Berlin Heidelberg",
address="Berlin, Heidelberg",
pages="85--131",
isbn="978-3-540-88588-7",
doi="10.1007/978-3-540-88588-7_3",
url="https://doi.org/10.1007/978-3-540-88588-7_3"
}

@article{Goray10,
author = {Leonid I. Goray and Gunther Schmidt},
journal = {J. Opt. Soc. Am. A},
keywords = {Diffraction gratings; Diffraction theory; Diffraction theory; Electromagnetic optics ; Polarization; Scattering measurements},
number = {3},
pages = {585--597},
publisher = {OSA},
title = {Solving conical diffraction grating problems with integral equations},
volume = {27},
month = {Mar},
year = {2010},
url = {http://josaa.osa.org/abstract.cfm?URI=josaa-27-3-585},
doi = {10.1364/JOSAA.27.000585},
abstract = {Off-plane scattering of time-harmonic plane waves by a plane diffraction grating with arbitrary conductivity and general surface profile is considered in a rigorous electromagnetic formulation. Integral equations for conical diffraction are obtained involving, besides the boundary integrals of the single and double layer potentials, singular integrals, the tangential derivative of single-layer potentials. We derive an explicit formula for the calculation of the absorption in conical diffraction. Some rules that are expedient for the numerical implementation of the theory are presented. The efficiencies and polarization angles compared with those obtained by Lifeng Li for transmission and reflection gratings are in a good agreement. The code developed and tested is found to be accurate and efficient for solving off-plane diffraction problems including high-conductive gratings, surfaces with edges, real profiles, and gratings working at short wavelengths.},
}

@proceeding{Gullikson01,
author = {Gullikson, Eric M. and Mrowka, Stanley and Kaufmann, Benjamin B.},
title = "{Recent developments in EUV reflectometry at the Advanced Light Source}",
journal = {Proc. SPIE},
volume = {4343},
number = {},
pages = {363-373},
abstract = {In order to satisfy the metrology requirements of multilayer coatings for EUVL optics and masks, improvements have been made to the reflectometry beamline at the Advanced Light Source. The precision in determining multilayer peak reflectance and wavelength has been improved by reducing the measurement noise. The peak reflectance of a typical Mo/Si multilayer can now be measured with a precision of 0.08% rms (relative) and the centroid wavelength with a precision of 0.007% rms. It has now been possible to determine the contribution of scattered light to the spectral purity. Under the typical measurement conditions the scattered light accounts for about 1.3% of the incident beam. With an appropriate slit it is possible to reduce the scattered light to 0.25%. By correcting for the remaining scattered light, it is estimated that a reflectance accuracy of 0.1% (absolute) is obtained for a typical Mo/Si multilayer.},
year = {2001},
doi = {10.1117/12.436712}
}

@ARTICLE{Haisma96,
   author = {{Haisma}, J. and {Verheijen}, M. and {van den Heuvel}, K. and 
  {van den Berg}, J.},
    title = "{Mold-assisted nanolithography: A process for reliable pattern replication}",
  journal = {Journal of Vacuum Science Technology B: Microelectronics and Nanometer Structures},
     year = 1996,
   volume = 14,
    pages = {4124-4128},
      doi = {10.1116/1.588604},
   adsurl = {http://adsabs.harvard.edu/abs/1996JVSTB..14.4124H},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = nov,

@article{Hench90,
author = {Larry L. Hench and Jon K. West},
title = {The sol-gel process},
journal = {Chemical Reviews},
volume = {90},
number = {1},
pages = {33-72},
year = {1990},
doi = {10.1021/cr00099a003}
}

@article{Horiba_2012,
  doi = {10.1143/jjap.51.06fj06},
  url = {https://doi.org/10.1143%2Fjjap.51.06fj06},
  year = 2012,
  month = {jun},
  publisher = {Japan Society of Applied Physics},
  volume = {51},
  pages = {06FJ06},
  author = {Akira Horiba and Masaaki Yasuda and Hiroaki Kawata and Makoto Okada and Shinji Matsui and Yoshihiko Hirai},
  title = {Impact of Resist Shrinkage and Its Correction in Nanoimprint Lithography},
  journal = {Japanese Journal of Applied Physics},
  abstract = {Relative critical dimension (CD) errors in nanoimprint lithography are estimated by numerical simulation for various pattern sizes. From the results, transfer functions to estimate the CD errors are proposed, which are expressed similarly to a low- or high-pass filter in terms of the spatial frequency. Using the transfer functions, the mold pattern sizes are corrected to compensate the shrinkage.}
}

@article{Ji10,
title = "{UV enhanced substrate conformal imprint lithography (UV-SCIL) technique for photonic crystals patterning in LED manufacturing}",
journal = "Microelectronic Engineering",
volume = "87",
number = "5",
pages = "963 - 967",
year = "2010",
note = "The 35th International Conference on Micro- and Nano-Engineering (MNE)",
issn = "0167-9317",
doi = "https://doi.org/10.1016/j.mee.2009.11.134",
url = "http://www.sciencedirect.com/science/article/pii/S0167931709007990",
author = "Ran Ji and Michael Hornung and Marc A. Verschuuren and Robert van de Laar and Jan van Eekelen and Ulrich Plachetka and Michael Moeller and Christian Moormann",
keywords = "NIL, SCIL, Working stamp, Photonic crystals, LED, Manufacturing",
abstract = "The global LED (light emitting diode) market reached 5 billion dollors in 2008 and will be driven towards 9 billion dollors by 2011 [1]. The current applications are dominated by portable device backlighting, e.g. cell phones, PDAs, GPS, laptop etc. In order to open the general lighting market doors the luminous efficiency needs to be improved significantly. Photonic crystal (PhC) structures in LEDs have been demonstrated to enhance light extraction efficiency on the wafer level by researchers [2]. However, there is still a great challenge to fabricate PhC structures on LED wafers cost-effectively. Nanoimprint lithography (NIL) [3] has attracted considerable attentions in this field due to its high resolution, high throughput and low cost of ownership (CoO). However, the current NIL techniques with rigid stamps rely strongly on the substrate flatness and the production atmosphere. Those factors hinder the integration of NIL into high volume production lines. UV-NIL with flexible stamps [4], e.g. PDMS stamps, allows the large-area imprint in a single step and is less-sensitive to the production atmosphere. However, the resolution is normally limited due to stamp distortion caused by imprint pressure. A novel NIL technique developed by Philips Research and Süss MicroTec, substrate conformal imprint lithography (SCIL), bridges the gap between UV-NIL with rigid stamp for best resolution and soft stamp for large-area patterning. Based on a cost-effective upgrade on Süss mask aligner, the capability can be enhanced to nanoimprint with resolution of down to sub-10nm on an up to 6 inch area without affecting the established conventional optical lithographic processes on the machine. Benefit from the exposure unit on the mask aligners, the SCIL process is now extended with UV-curing option, which can help to improve the throughput dramatically. In this paper, the fabrication of photonic crystal structures with SCIL technique on Süss MA6 mask aligner is demonstrated. In addition, the industrialization considerations of UV-SCIL process in high volume manufacturing are briefly discussed."
}

@BOOK{Loewen97,
   author = {{Loewen}, E.~G. and {Popov}, E.},
    title = "{Diffraction gratings and applications}",
    publisher = {CRC Press},
     year = 1997
} 

@ARTICLE{Marlowe16,
   author = {{Marlowe}, H. and {McEntaffer}, R.~L. and {Tutt}, J.~H. and 
  {DeRoo}, C.~T. and {Miles}, D.~M. and {Goray}, L.~I. and {Soltwisch}, V. and 
  {Scholze}, F. and {Herrero}, A.~F. and {Laubis}, C.},
    title = "{Modeling and empirical characterization of the polarization response of off-plane reflection gratings}",
  journal = {Applied Optics},
     year = 2016,
    month = jul,
   volume = 55,
    pages = {5548},
      doi = {10.1364/AO.55.005548},
   adsurl = {http://adsabs.harvard.edu/abs/2016ApOpt..55.5548M},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@article{McCoy18,
  title = "Fabrication of astronomical x-ray reflection gratings using thermally activated selective topography equilibration",
  abstract = "Thermally activated selective topography equilibration (TASTE) enables the creation of 3D structures in resist using grayscale electron-beam lithography followed by a thermal treatment to induce a selective polymer reflow. A blazed grating topography can be created by reflowing repeating staircase patterns in resist into wedgelike structures. Motivated by astronomical applications, such patterns with periodicities 840 and 400 nm have been fabricated in 130 nm-thick poly(methyl methacrylate) using TASTE to provide a base for x-ray reflection gratings. A path forward to integrate this alternative blazing technique into grating fabrication recipes is discussed.",
  author = "McCoy, {Jake A.} and McEntaffer, {Randall Lee} and Chad Eichfeld",
  year = "2018",
  month = "11",
  day = "1",
  doi = "10.1116/1.5048197",
  language = "English (US)",
  volume = "36",
  journal = "Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics",
  issn = "2166-2746",
  publisher = "AVS Science and Technology Society",
  number = "6",
}

@article{McCoy20,
  doi = {10.3847/1538-4357/ab76d3},
  url = {https://doi.org/10.3847%2F1538-4357%2Fab76d3},
  year = {2020},
  month = {mar},
  publisher = {American Astronomical Society},
  volume = {891},
  number = {2},
  pages = {114},
  author = {Jake A. McCoy and Randall L. McEntaffer and Drew M. Miles},
  title = {Extreme Ultraviolet and Soft X-Ray Diffraction Efficiency of a Blazed Reflection Grating Fabricated by Thermally Activated Selective Topography Equilibration},
  journal = {The Astrophysical Journal},
  abstract = {Future observatories utilizing reflection grating spectrometers for extreme ultraviolet (EUV) and soft X-ray (SXR) spectroscopy require high-fidelity gratings with both blazed groove facets and custom groove layouts that are often fanned or feature a slight curvature. While fabrication procedures centering on wet anisotropic etching in monocrystalline silicon produce highly efficient blazed gratings, the precision of a nonparallel groove layout is limited by the cubic structure of the silicon crystal. This motivates the pursuit of alternative techniques to grating manufacture, namely thermally activated selective topography equilibration (TASTE), which uses gray-scale electron-beam lithography to pattern multilevel structures in resist followed by an optimized polymer thermal reflow to smooth the 3D patterns into continuous surface relief profiles. Using TASTE, a mold for a reflection grating with a periodicity of 400 nm and grooves resembling an asymmetric sawtooth was patterned in 130 nm thick poly(methyl methacrylate) resist on a silicon substrate over a 50 mm by 7.5 mm area. This structure was coated with 15 nm of gold by electron-beam physical vapor deposition using titanium as an adhesion layer and then tested for EUV and SXR diffraction efficiency at beamline 6.3.2 of the Advanced Light Source synchrotron facility. Results demonstrate a quasi-blaze response characteristic of a 27◦ blaze angle with groove facets smooth to 1.5 nm rms. Absolute peak-order efficiency ranges from 75% to 25%, while total relative efficiency measures ⪆90% across the measured bandpass of 15.5 nm > λ > 1.55 nm.}
}

@ARTICLE{McEntaffer13,
   author = {{McEntaffer}, R. and {DeRoo}, C. and {Schultz}, T. and {Gantner}, B. and 
  {Tutt}, J. and {Holland}, A. and {O'Dell}, S. and {Gaskin}, J. and 
  {Kolodziejczak}, J. and {Zhang}, W.~W. and {Chan}, K.-W. and 
  {Biskach}, M. and {McClelland}, R. and {Iazikov}, D. and {Wang}, X. and 
  {Koecher}, L.},
    title = "{First results from a next-generation off-plane X-ray diffraction grating}",
  journal = {Experimental Astronomy},
archivePrefix = "arXiv",
   eprint = {1301.5531},
 primaryClass = "astro-ph.IM",
 keywords = {X-ray spectroscopy, Off-plane reflection gratings, X-ray diffraction},
     year = 2013,
   volume = 36,
    pages = {389-405},
      doi = {10.1007/s10686-013-9338-1},
   adsurl = {http://adsabs.harvard.edu/abs/2013ExA....36..389M},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
} %month = aug,

@article{McEntaffer19,
title = "{Reflection grating concept for the Lynx X-Ray Grating Spectrograph}",
abstract = {The Lynx X-ray Grating Spectrograph (XGS) is responsible for providing high throughput and spectral resolution for soft x-ray energies. This instrument will help characterize the formation of galaxies and a large-scale structure in the universe. Such goals require large effective areas, >4000 cm 2 , and high resolving power, R > 5000, over much of the low-energy band, 0.2 to 2.0 keV. A concept design for the XGS using reflection gratings has the potential to achieve these requirements. The design uses achievable grating parameters, efficient packing of the grating array, and a compact detector layout. The concept is presented along with a detailed discussion of the considerations made in its determination.},
author = "{{McEntaffer}, R.}",
year = {2019},
month = {4},
day = {1},
doi = {10.1117/1.JATIS.5.2.021002},
volume = {5},
journal = {Journal of Astronomical Telescopes, Instruments, and Systems},
issn = {2329-4124},
publisher = {SPIE},
number = {2}
}

@article{Chopra15,
author = {Meghali J. Chopra and Roger T. Bonnecaze},
title = {{Impact of polymer curing on two-dimensional and three-dimensional shape change in nanoimprint lithography}},
volume = {14},
journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
number = {4},
publisher = {SPIE},
pages = {1 -- 8},
keywords = {nanoimprint lithography, nanomanufacturing, curing, pattern transfer, Etching, Polymers, Diamond, Nanoimprint lithography, Distortion, Anisotropic etching, Oxides, 3D image processing, 3D modeling, Image processing},
year = {2015},
doi = {10.1117/1.JMM.14.4.044502},
URL = {https://doi.org/10.1117/1.JMM.14.4.044502}
}


@article{Miles18,
  doi = {10.3847/1538-4357/aaec73},
  year = 2018,
  month = {dec},
  publisher = {American Astronomical Society},
  volume = {869},
  number = {2},
  pages = {95},
  author = {Drew M. Miles and Jake A. McCoy and Randall L. McEntaffer and Chad M. Eichfeld and Guy Lavallee and Michael Labella and William Drawl and Bangzhi Liu and Casey T. DeRoo and Tyler Steiner},
  title = {Fabrication and Diffraction Efficiency of a Large-format, Replicated X-Ray Reflection Grating},
  journal = {The Astrophysical Journal},

  abstract = {We present the methodology used to fabricate an X-ray reflection grating and describe a technique for grating replication. Further, we present the experimental procedure and results of a study to measure the diffraction efficiency of a replicated X-ray reflection grating in an extreme off-plane geometry. The blazed grating demonstrates a total diffraction efficiency of ∼60\% from 0.34 to 1.2 keV at a grazing angle of ∼1.°5, with single-order efficiency ranging from ∼35\% to 65\% for energies within the blaze envelope. The diffraction efficiency of the grating measured relative to the reflectivity of the metal coating averages ∼90\% above 0.34 keV. Data collected as a function of beam position on the grating indicate a relative variation in total efficiency of <1\% rms across the grating surface.}

}

@article{Miles19,
author = {Drew M. Miles and Samuel V. Hull and Ted B. Schultz and James H. Tutt and Mitchell Wages and Benjamin D. Donovan and Randall L. McEntaffer and Abraham D. Falcone and Tyler B. Anderson and Evan Bray and David N. Burrows and Tanmoy Chattopadhyay and Chad M. Eichfeld and Nathan Empson and Fabien Grisé and Christopher R. Hillman and Jake A. McCoy and Maria McQuaide and Bailey J. Myers and Tyler Steiner and Marc A. Verschuuren and Daniel Yastishock and Ningxiao Zhang},
title = {{Water Recovery X-Ray Rocket grating spectrometer}},
volume = {5},
journal = {Journal of Astronomical Telescopes, Instruments, and Systems},
number = {4},
publisher = {SPIE},
pages = {1 -- 11},
keywords = {x-ray, spectrometer, sounding rocket, hybrid CMOS, reflection grating, water recovery, X-rays, Rockets, Diffraction gratings, Sensors, Spectroscopy, Calibration, X-ray detectors, Diffraction, Mirrors, X-ray technology},
year = {2019},
doi = {10.1117/1.JATIS.5.4.044006},
URL = {https://doi.org/10.1117/1.JATIS.5.4.044006}
}

@INPROCEEDINGS{Miles19b,
       author = {{Miles}, Drew M. and {McEntaffer}, Randall M. and {Tutt}, James H. and
         {Anderson}, Tyler and {Weiss}, Matthew and {Baker}, Logan and
         {Weston}, Joseph and {O'Meara}, Bridget and {McCurdy}, Ross C. and
         {Myers}, Bailey and {Gris{\'e}}, Fabien},
        title = "{An introduction to the Rockets for Extended-source X-ray Spectroscopy}",
        journal = {Proc. SPIE},
         year = 2019,
       series = {Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series},
       volume = {11118},
        month = sep,
          eid = {111180B},
        pages = {111180B},
          doi = {10.1117/12.2529567},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2019SPIE11118E..0BM},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@article{Muhlestein19,
author = {Joseph B. Muhlestein and Benjamin D. Smith and Margaret Miles and Stephanie M. Thomas and Anthony Willey and David D. Allred and R. Steven Turley},
journal = {Opt. Express},
keywords = {Condensed matter; Electromagnetic radiation; Optical constants; Refractive index; Synchrotron radiation; Thin films},
number = {3},
pages = {3324--3336},
publisher = {OSA},
title = "{Y2O3 optical constants between 5 nm and 50 nm}",
volume = {27},
month = {Feb},
year = {2019},
doi = {10.1364/OE.27.003324}
}


@ARTICLE{Neviere78,
       author = {{Neviere}, M. and {Maystre}, D. and {Hunter}, W.~R.},
        title = "{On the use of classical and conical diffraction mountings for xuv gratings.}",
      journal = {Journal of the Optical Society of America (1917-1983)},
     keywords = {Conical Bodies, Far Ultraviolet Radiation, Gratings (Spectra), Mounting, Transmission Efficiency, Wave Diffraction, Aberration, Astigmatism, Invariance, Light Scattering, Light Transmission, Optics, Astronomical Optics},
         year = "1978",
        month = "Aug",
       volume = {68},
        pages = {1106-1113},
       adsurl = {https://ui.adsabs.harvard.edu/abs/1978JOSA...68.1106N},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@article{Nevot80,
  title={Caract{\'e}risation des surfaces par r{\'e}flexion rasante de rayons X. Application {\`a} l'{\'e}tude du polissage de quelques verres silicates},
  author={Nevot, L and Croce, P},
  journal={Revue de Physique appliqu{\'e}e},
  volume={15},
  number={3},
  pages={761--779},
  year={1980},
  publisher={Soci{\'e}t{\'e} Fran{\c{c}}aise de Physique}
}

@article{Qin10,
author = {Qin, Dong and Xia, Younan and Whitesides, George},
year = {2010},
month = {03},
pages = {491-502},
title = {Soft Lithography for Micro- and Nanoscale Patterning},
volume = {5},
journal = {Nature protocols},
doi = {10.1038/nprot.2009.234}
}

@article{Schift08,
author = {Schift,Helmut },
title = "{Nanoimprint lithography: An old story in modern times? A review}",
journal = {Journal of Vacuum Science \& Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena},
volume = {26},
number = {2},
pages = {458-480},
year = {2008},
doi = {10.1116/1.2890972},

URL = { 
        https://avs.scitation.org/doi/abs/10.1116/1.2890972
    
},
eprint = { 
        https://avs.scitation.org/doi/pdf/10.1116/1.2890972
    
}

}

@Inbook{Schift10,
author="Schift, Helmut
and Kristensen, Anders",
editor="Bhushan, Bharat",
title="Nanoimprint Lithography -- Patterning of Resists Using Molding",
bookTitle="Springer Handbook of Nanotechnology",
year="2010",
publisher="Springer Berlin Heidelberg",
address="Berlin, Heidelberg",
pages="271--312",
abstract="Nanoimprint lithography (NIL) is an emerging high-resolution parallel patterning method, mainly aimed nanoimprintlithography (NIL)photolithography (PL)towards fields in which electron-beam and high-end photolithography are costly and do not provide sufficient resolution at reasonable throughput. In a top-down approach, a surface pattern of a stamp is replicated into a material by mechanical contact and three-dimensional material displacement. This can be done by shaping a liquid followed by a curing process for hardening, by variation of the thermomechanical properties of a film by heating and cooling, or by any other kind of shaping process using the difference in hardness of a mold and a moldable material. The local thickness contrast of the resulting thin molded film can be used as a means to pattern an underlying substrate at the wafer level by standard pattern transfer methods, but also directly in applications where a bulk modified functional layer is needed. This makes NIL a promising technique for volume manufacture of nanostructured components. At present, structures with feature sizes down to 5{\thinspace}nm have been realized, and the resolution is limited by the ability to manufacture the stamp relief. For historical thermalNILhot embossingreasons, the term nanoimprint lithography refers to a hot embossing process (thermal NIL). In UV-NILultraviolet (UV)-NIL, resinUV-transparent stampa photopolymerizable resin is used together with a UV-transparent stamp. In both processes thin-film squeeze flow and capillary action play a central role in understanding the NIL process. In this chapter we will give an overview of NIL, with emphasis on general principles and concepts rather than specific process issues and state-of-the-art tools and processes. Material aspects of stamps and resists are discussed. We discuss specific applications where imprint methods have significant advantages over other structuring methods. We conclude by discussing areas where further development in this field is required.",
isbn="978-3-642-02525-9",
doi="10.1007/978-3-642-02525-9_9",
url="https://doi.org/10.1007/978-3-642-02525-9_9"
}

@article{Schmid00,
author = {Schmid, H. and Michel, Bruno},
year = {2000},
month = {03},
pages = {3042-3049},
title = {Siloxane Polymers for High-Resolution, High-Accuracy Soft Lithography},
volume = {33},
journal = {Macromolecules},
doi = {10.1021/ma982034l}
}%H-PDMS

@article{Shibata10,
author = {Shibata, Mayuko  and Horiba, Akira  and Nagaoka, Yoshinori  and Kawata, Hiroaki  and Yasuda, Masaaki  and Hirai, Yoshihiko },
title = "{Process-simulation system for UV-nanoimprint lithography}",
journal = {Journal of Vacuum Science \& Technology B},
volume = {28},
number = {6},
pages = {C6M108-C6M113},
year = {2010},
doi = {10.1116/1.3511789}
}

@ARTICLE{Tutt16,
       author = {{Tutt}, James H. and {McEntaffer}, Randall L. and {Marlowe}, Hannah and
         {Miles}, Drew M. and {Peterson}, Thomas J. and {DeRoo}, Casey T. and
         {Scholze}, Frank and {Laubis}, Christian},
        title = "{Diffraction Efficiency Testing of Sinusoidal and Blazed Off-Plane Reflection Gratings}",
      journal = {Journal of Astronomical Instrumentation},
     keywords = {Diffraction, reflection gratings, grazing incidence, off-plane, X-rays},
         year = 2016,
        month = {September},
       volume = {5},
       number = {3},
          eid = {1650009},
        pages = {1650009},
          doi = {10.1142/S2251171716500094},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2016JAI.....550009T},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@INPROCEEDINGS{Tutt18,
       author = {{Tutt}, James H. and {McEntaffer}, Randall L. and {Donovan}, Benjamin and
         {Schultz}, Ted B. and {Biskach}, Michael P. and {Chan}, Kai-Wing and
         {Kearney}, John D. and {Mazzarella}, James R. and {McClelland
        }, Ryan S. and {Riveros}, Raul E. and {Saha}, Timo T. and
         {Hlinka}, Michal and {Zhang}, William W. and {Soman}, Matthew R. and
         {Holland}, Andrew D. and {Lewis}, Matthew R. and {Holland}, Karen and
         {Murray}, Neil J.},
        title = "{The Off-plane Grating Rocket Experiment (OGRE) system overview}",
    journal = {Proc. SPIE},
         year = 2018,
       series = {Society of Photo-Optical Instrumentation Engineers (SPIE) Conference Series},
       volume = {10699},
        month = jul,
          eid = {106996H},
        pages = {106996H},
          doi = {10.1117/12.2311813},
       adsurl = {https://ui.adsabs.harvard.edu/abs/2018SPIE10699E..6HT},
      adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}


@article{Underwood96,
author = {J. H. Underwood and E. M. Gullikson and M. Koike and P. J. Batson and P. E. Denham and K. D. Franck and R. E. Tackaberry and W. F. Steele},
title = {Calibration and standards beamline 6.3.2 at the Advanced Light Source},
journal = {Review of Scientific Instruments},
volume = {67},
number = {9},
pages = {3372-3372},
year = {1996},
doi = {10.1063/1.1147338}
}

@PHDTHESIS{Verschuuren10,
   author = {{Verschuuren}, M.~A.},
    title = "{Substrate conformal imprint lithography for nanophotonics}",
 keywords = {Thin film solar cell, Plasmonic, PDMS stamps, VCSEL laser, SCIL, Photonic crystal LED, Plasmonics, Sol-gel, Nanophotonics, Soft nanoimprint},
   school = {Utrecht University},
     year = 2010,
    month = March,
   adsurl = {http://adsabs.harvard.edu/abs/2010PhDT........81V},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@ARTICLE{Verschuuren17,
   author = {{Verschuuren}, M.~A. and {Megens}, M. and {Ni}, Y. and {van Sprang}, H. and 
  {Polman}, A.},
    title = "{Large area nanoimprint by substrate conformal imprint lithography (SCIL)}",
  journal = {Advanced Optical Technologies},
 keywords = {high volume manufacturing, nanoimprint, overlay alignment, PDMS, soft stamps, sol-gel resist},
     year = 2017,
    month = jun,
   volume = 6,
    pages = {243-264},
      doi = {10.1515/aot-2017-0022},
   adsurl = {http://adsabs.harvard.edu/abs/2017AdOT....6..243V},
  adsnote = {Provided by the SAO/NASA Astrophysics Data System}
}

@inproceedings{Verschuuren18,
author = {Marc A. Verschuuren and Jake McCoy and Rebecca P. Huber and Remco van Brakel and Manuel Paans and Rob Voorkamp},
title = {{AutoSCIL 200mm tooling in production, x-ray optics, and cell growth templates}},
volume = {10584},
booktitle = {Novel Patterning Technologies 2018},
editor = {Eric M. Panning},
organization = {International Society for Optics and Photonics},
publisher = {SPIE},
pages = {185 -- 197},
keywords = {soft nanoimprint, SCIL, x-ray optics, cell growth templates, overlay alignment, sol-gel resist},
year = {2018},
doi = {10.1117/12.2297445},
URL = {https://doi.org/10.1117/12.2297445}
}

@article{Verschuuren19,
  doi = {10.1088/1361-6528/ab1c86},
  url = {https://doi.org/10.1088%2F1361-6528%2Fab1c86},
  year = 2019,
  month = {jun},
  publisher = {{IOP} Publishing},
  volume = {30},
  number = {34},
  pages = {345301},
  author = {M A Verschuuren and M W Knight and M Megens and A Polman},
  title = {Nanoscale spatial limitations of large-area substrate conformal imprint lithography},
  journal = {Nanotechnology},

  abstract = {We demonstrate a soft-imprint nanofabrication technique offering nanometer resolution over an area as large as a 150 mm diameter wafer. It makes use of a composite imprint stamp composed of a quaternary siloxane-modified poly-di-methyl-siloxane patterned rubber layer with a relatively high Young’s modulus that is laminated on a thin glass support. The in-plane stiffness of the stamp avoids pattern deformation over large areas, while out-of-plane flexibility allows conformal contact to be made over the entire substrate area. The stamp is used in conjunction with a novel tetra-methyl-ortho-siloxane/methyl-tri-methoxy-siloxane sol-gel imprint resist material developed to replicate nanoscale features in rigid silica at room temperature. We demonstrate better than 10 nm resolution in imprinted line gratings and individual pillars with aspect ratio as high as 5:1. Gaps as small as 6 nm can be reproduced. The patterns can be used as an etch mask to pattern 150 mm diameter silicon and quartz substrates while maintaining sub-10 nm resolution.}
}

@article{Zhuang07,
title = "{Vapor Phase Self-assembled Monolayers for Anti-stiction Applications in MEMS}",
abstract = {We have investigated the anti-stiction performance of self-assembled monolayers (SAMs) that were grown in vapor phase from six different organosilane precursors: CF3(CF2)5(CH2)2SiCl3 (FOTS), CF3(CF2)5(CH2)2Si(OC2H5)3 (FOTES), CF3(CF2)5(CH2)2Si(CH3)Cl2 (FOMDS), CF3(CF2)5(CH2)2Si(CH3)2Cl (FOMMS), CF3(CF2)7(CH2)2SiCl3 (FDTS), and CH3(CH2)17(CH2)2SiCl3 (OTS). The SAM coatings that were grown on silicon substrates were characterized with respect to static contact angle, surface energy, roughness, nanoscale adhesive force, nanoscale friction force, and thermal stability. The best overall anti-stiction performance was achieved using FDTS as precursor for the SAM growth, but all coatings show good potential for solving in-use stiction problems in microelectromechanical systems devices.},
author = {Yanxin Zhuang and Ole Hansen and Thomas Knieling and Christian Wang and Pirmin Rombach and Walter Lang and Wolfgang Benecke and Markus Kehlenbeck and J{\"o}rn Koblitz},
year = {2007},
doi = {10.1109/JMEMS.2007.904342},
volume = "16",
pages = {1451--1460},
journal = {I E E E Journal of Microelectromechanical Systems},
publisher = {Institute of Electrical and Electronics Engineers},
number = {6}
}